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  Untitled Document Chemical composition of metals, alloys, semiconductors, and deposited films on surfaces in ultra-high vacuum (UHV):
  • Growth mode of deposited films,
  • Crystalline structure of surfaces (LEED),
  • Crystalline structure of first few atomic layers (DAES, DEPES).
Experimental methods:
  • Auger Electron Spectroscopy (AES),
  • Low Energy Electron Diffraction (LEED),
  • Directional Auger Electron Spectroscopy (DAES) [1,2],
  • Directional Elastic Peak Electron Spectroscopy (DEPES) [1],
  • Scanning Electron Microscopy (SEM),
  • Characteristic Electron Energy Loss Spectroscopy (Characteristic EELS),
  • Mass spectrometry (MS),
  • Scanning Tunneling Microscopy (STM).
Theoretical approximations:
  • Multiple Scattering (MS) approximation for the primary electron plane wave [3],
  • Tensor LEED,
  • DFT calculations (ABINIT).
References:
  1. S. Mróz and M. Nowicki, Surface Science 297 (1993) 66-70.
  2. S. Mróz, Surface Review and Letters 4 (1997) 117.
  3. I. Morawski, M. Nowicki, Physical Review B 75 (2007) 155412.
 
 
 
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